- 63.5mmX127mm英寸UT 1X光刻版的設計及製造
Design and manufacture of 63.5mm×127mm UT 1X reticle
- 浸沒式ArF光刻CD均勻性研究
Study on CD Uniformity in ArF Immersion Lithography
- 光刻-從掩膜到圓片轉移的過程。
Lithography - The process used to transfer patterns onto wafers.
- 計算機光刻全息圖的視角研究
Study On The Visual Angle of Computerized Photoetching Hologram
- 遠紫外光刻的實驗研究
The Experimental Study of Far Ultraviolet Lithography
- 分步重複投影光刻機(DSW)照明光學系統的研製
Developing of Illuminating Optical System in Stepper(DSW)
- 用於T形柵光刻的新型移相掩模技術
Novel PSM technology for T-shaped gate lithography
- 193 nm光刻散射條技術研究
A Study on Scattering Bar in 193 nm Lithography